Simulation of circular saw discs coating procedure employing Physical Vapor Deposition (PVD) method. This metallization technique is used in a wide variety of other applications such as semiconductor wafers, photovoltaic cells, thin-film batteries, optical coatings, etc.. Present modeling can be utilized to optimize different output parameters of PVD: layer thickness uniformity, energetic efficiency, process duration, costs and productivity.


Vacuum chamber
Vacuum chamber
Circular saw discs
Circular saw discs
Vapor velocity field
Vapor velocity field

Platform used

  • CPU: AMD FX(tm)-6300 Six-Core Processor 3.5GHz
  • RAM: 8Gb
  • GPU: Sapphire AMD Radeon HD 7950 3GB GDDR5 Boost OC
  • OS: 64-bit Debian GNU/Linux

Numerical setup

  • Domain size: 204 x 204 x 373
  • Number of points: 15’522’768
  • Resolution: 0.36 cm
  • Physical size: 72 x 72 x 133 cm³
  • Number of iterations: 30’000
  • Physical time: 3600 s


  • Computation time: 1018 s